Congratulations to Brandon Holybee for successfully defending his thesis titled “Deciphering the role of surface composition and topography in self-organized ion-induced nanopatterning of multicomponent semiconductors with in-situ and in-operando metrology” this fall. Brandon has accepted a position starting this winter at Intel Corporation’s Components Research, the research arm for Intel’s Technology and Manufacturing Group. Best of luck to Brandon from all RSSEL members!