From September 14-19, Brandon Holybee and Zak Koyn attended the 19th International Conference on Ion Beam Modification of Materials in Leuven, Belgium.  Brandon presented the poster “The role of composition profile and evolution on ion induced patterning of III-V semiconductor surfaces.”  Zak presented the poster “Dual-beam ion irradiation of silicon: experimental results and modeling.”  In addition to the poster presentations, both students attended many talks on high profile research being conducted in the field of ion-surface interactions.